Silicon Carbide Crystal Growth Furnace

Product Details
Customization: Available
Certification: CE, ISO
Place Style: Vertical
Gold Member Since 2024

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Registered Capital
1000000 RMB
Plant Area
101~500 square meters
  • Silicon Carbide Crystal Growth Furnace
  • Silicon Carbide Crystal Growth Furnace
  • Silicon Carbide Crystal Growth Furnace
  • Silicon Carbide Crystal Growth Furnace
  • Silicon Carbide Crystal Growth Furnace
  • Silicon Carbide Crystal Growth Furnace
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Basic Info.

Model NO.
6 inches& 8 inches
Range of Applications
Industrial
Type
Crucible Melting Furnace
Usage
Aluminum Die-casting
Fuel
Electric
Inch
6&8
Transport Package
Carrier Base, Clamping Components, Turning Parts,
Specification
tower
Trademark
KY
Origin
China
HS Code
8486109000
Production Capacity
5000

Product Description

Silicon carbide crystal growth furnace
1. Equipment structure
Silicon Carbide Crystal Growth Furnace
2. Equipment overview
The silicon carbide crystal growth furnace is mainly used to grow large-sized, high-quality SiC single crystals using the physical vapor transport method (PVT).
3. Technical advantages
1. Adopt a dual-coil design and based on multi-physics simulation, optimize the spacing, number of turns, coil position and other parameters of the two coils to achieve independent control of the temperature field of the seed crystal and the source, and achieve large-size and high-quality silicon carbide growth. The warm field.
2. Carry out research on the design of the crucible's independent rotating mechanism, and innovatively introduce an independent support design into the crucible's rotating structure, so that the crucible can rotate independently of the heat preservation during the growth process and reduce the impact of heat preservation on the temperature field of the crucible. Solve the problem of uncontrollable temperature field due to thermal insulation loss and deformation between furnaces during the growth of silicon carbide single crystal, and improve the crystal growth yield.
3. Combine numerical simulation and theoretical calculations to optimize the crucible and temperature gradient structures, reveal the crystallization and kinetic processes, break through the preparation process of 6-inch SiC crystals, and effectively solve the difficult problem of defect enrichment in SiC crystals.
4. Equipment parameters
quartz reflector Diameter 440mmx900mm Power frequency, HZ 50±1
Maximum operating temperature 2600° C (in argon)   Number of phases 3
working gas Argon, Nitrogen Compressed gas, MPa 0.6
Maximum vacuum value Torr 10-5 Torr Maximum power, kw 50
Generator power kw 70kw Crystal growth days, days 7
Generator power frequency kHz 12kHz Nitrogen consumption, m3/furnace ≤0.25
Automated parameter control system   Electrode connection method
cooling system 50kW cooling unit (closed circuit) Equipment dimensions (length x width x height) mm 920x920x2790
Supply voltage, V 380±19 Maximum current, A 90
Output voltage, V 500-550    
Note: Customized services can be provided according to customer requirements

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