8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate

Product Details
Customization: Available
Application: Diode, Power Electronic Components
Certification: RoHS
Manufacturer/Factory, Trading Company
Gold Member Since 2024

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Registered Capital
1000000 RMB
Plant Area
101~500 square meters
  • 8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
  • 8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
  • 8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
  • 8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
  • 8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
  • 8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
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Overview

Basic Info.

Model NO.
4H N-type Ultra-P Grade
Type
N-Type Semiconductor
Diameter
8 Inch
Thickness
500±25μm
Poly Type
4h
Resistivity
0.015~0.025ohm·cm
Ttv
≤7μm
Warp
≤30μm
(Afm) Front (Si-Face) Roughness
Ra≤0.2nm
Transport Package
Multi-Waferorsingle Wafer Cassette Packaging
Specification
8Inch 4H N-type
Trademark
HC
Origin
China
HS Code
2804611900
Production Capacity
50000

Product Description

      The 8-inch N-type silicon carbide substrate is mainly used in new energy vehicles, high-voltage transmission and substations, white appliances, high-speed trains, motors, photovoltaic inverters, pulse power supplies and other fields. It has the advantages of reducing equipment energy loss, improving equipment reliability, reducing equipment size, and improving equipment performance. It has irreplaceable advantages in the manufacture of power electronic devices.
8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
                                                                                               8 Inch N-type SiC substrate wafer
No. Items Unit Ultra-P Grade Production Grade Dummy Grade
1.Boule Parameters
1.1   Polytype -- 4H 4H 4H
1.2  Surface orientation ° 4°toward<11-20>±0.5º 4°toward<11-20>±0.5º 4°toward<11-20>±0.5º
2. Electrical Parameters
2.1   Dopant -- n-type Nitrogen n-type Nitrogen n-type Nitrogen
2.2  Resistivity ohm·cm 0.015~0.025ohm·cm 0.015~0.025ohm·cm NA
3. Mechanical Parameters
3.1   Diameter mm 200.0±0.2mm 200.0±0.2mm 200.0±0.2mm
3.2   Thickness μm 500±25μm 500±25μm 500±25μm
3.3  Notch orientation ° [1-100]±5° [1-100]±5° [1-100]±5°
3.4  Notch depth mm 1~1.5mm 1~1.5mm 1~1.5mm
3.5   LTV μm 3μm(10mm*10mm) 5μm(10mm*10mm) 15μm(10mm*10mm)
3.6   TTV μm 7μm 10μm 20μm
3.7  Bow μm -20μm~20μm -25μm~25μm -65μm~65μm
3.8  Warp μm 30μm 35μm 70μm
3.9  (AFM) Front (Si-face)
Roughness
nm Ra0.2nm Ra0.2nm Ra0.2nm
4. Structure
4.1   Micropipe density ea/cm2 <0.2ea/cm2 <2ea/cm2 <50ea/cm2
4.2   Metal impurities atoms/cm2 1E11atoms/cm2(Al, Cr, Fe,
Ni, Cu, Zn, Pb, Na, K, Ti, Ca,
V, Mn)
1E11atoms/cm2(Al, Cr, Fe, Ni,
Cu, Zn, Pb, Na, K, Ti, Ca, V,Mn)
1E11atoms/cm2(Al, Cr, Fe, Ni,
Cu, Zn, Pb, Na, K, Ti, Ca, V,
Mn)
4.3   TSD ea/cm2 200ea/cm2 500ea/cm2 NA
4.4   BPD ea/cm2 1000ea/cm2 2000ea/cm2 NA
4.5  TED ea/cm2 3000ea/cm2 7000ea/cm2 NA
5.Front Quality
5.1  Front -- Si Si Si
5.2   Surface Finish -- CMP Si-face CMP CMP Si-face CMP CMP Si-face CMP
5.3  Particles ea/wafer 60(size0.3μm) 100(size0.3μm) NA
5.4  Scratches ea/mm 5,Total Length
1/2*Diameter
5,Total LengthDiameter NA
5.5  Edge
chips/indents/cracks/contamination/stains
-- None None NA
5.6  Polytype areas -- None None 30%Cumulative
area)
5.7   Front laser marking -- None None None
6. Back Quality
6.1   Back finish --  C-face polished C-face polished  C-face polished
6.2  Scratches ea/mm 5,Total LengthDiameter NA NA
6.3   Back defects (edge chips/indents) -- None None NA
6.4   Back roughness nm Ra5nm Ra5nm Ra5nm
6.5   Back laser marking -- NotchSEMI NotchSEMI NotchSEMI
7.Edge
7.1   Edge --  Chamfer  Chamfer  Chamfer
8. Packaging
8.1  Packaging -- Epi-ready
with vacuum packaging
Epi-ready
with vacuum packaging
Epi-ready
with vacuum packaging
8.2  Packaging --  Multi-wafer or
single wafer cassette packaging
 Multi-wafer or
single wafer cassette packaging
 Multi-wafer or
single wafer cassette packaging
Notes: "NA"means no request. Items not metioned may refer to SEMI-STD.
8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate
FAQ

Q1: What's the way of shipping ?
A:  We accept DHL, Fedex, TNT, UPS, EMS, SF and etc.
Q2: How to pay?
A:  T/T, PayPal and etc..
Q3: What's the deliver time?
A:  For inventory: the delivery time is 10 workdays.   For customized products: the delivery time is 10to 25 workdays. According to the quantity.
Q4: Can I customize the products based on my need?
 A: Yes, we can customize the specifications according to your needs.
Q5: How to guarantee the quality of your products?
 A: Strict detection during production.Strict sampling inspection on products before shipment and intact product packaging ensured.
 

8inch Ultra-P Grade 4h N Type Semiconductor Silicon Carbide Wafer Sic Substrate

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